The physics of SiO2 and its interfaces :  proceedings of the international topical conference on the physics of SiO2 and its interfaces, held at the IBM Thomas J. Watson Research Center, Yorktown Heights, New York, March 22-24, 1978 / 
editor, Sokrates T. Pantelides 
 - 487 páginas 
<br/><br/><label>ISBN: </label>0080230490 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Silico--Congresos<br/>Superficies (Física)--Congresos<br/>Química de superficies--Congresos
<br/><br/><label>LC Class. No.: </label>QC585.75S55  / I57 1978