| 000 | 00949nam a2200253zi 4500 | ||
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| 005 | 20200318115056.0 | ||
| 008 | 020418c 1999xxua f 000 0 eng d | ||
| 020 | _a0815514328 | ||
| 035 | _aMX001000914817 | ||
| 041 | _aSPA | ||
| 050 | 4 |
_aTS695 _bP54 1999 |
|
| 100 | 1 |
_aPierson, Hugh O., _eautor |
|
| 245 | 1 | 0 |
_aHandbook of chemical vapor deposition, cvd : _bprinciples, technology, and applications / _cBy Hugh O. Pierson |
| 250 | _a2nd ed. | ||
| 264 | 1 |
_aNorwich, New York : _bNoyes : _bW. Andrew, _cc1999 |
|
| 300 |
_axxiv, 482 páginas : _bilustraciones |
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| 490 | 0 | _aMaterials science and process technology series. electronic materials and process technology | |
| 500 | _aEdicion revisada de: Handbook of chemical vapor deposition (CVD), c1992 | ||
| 650 | 4 |
_aGalvanoplastia al vapor _vManuales |
|
| 336 |
_atexto _2rdacontent |
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| 337 |
_asin medio _2rdamedia |
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| 338 |
_avolumen _2rdacarrier |
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| 999 |
_c3661 _d3661 |
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